硅衬底GaN基光电材料外延生长Epitaxial Growth of GaN Based Photoelectric Materials on Silicon Substrate孙钱中国科学院苏州纳米技术与纳米仿生研究所研究员SUN QianProfessorof Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences

等离子体辅助分子束外延生长AlN薄膜AlN epilayers grown by plasma assisted molecular beam epitaxy刘欢南京大学LIU HuanNanjing University

6英寸复合衬底上厚GaN外延生长研究Growth of Thick GaN Epilayers on 150mm Engineered Substrate韩颖中国电子科技集团第十三所高级工程师HAN YingSenior Engineer of Hebei Semiconductor Research Institute

氧化镓PECVD外延生长及光电信息感知器件研究Research on PECVD Epitaxial Growth of Gallium Oxide and the Photoelectric Information Sensing Devices李山南京邮电大学副教授、苏州镓和半导体研发总监LI ShanAssociate Professor, Nanjing University of Posts and Telecommunications, RD director of Suzhou GAO Semiconductor Co. Ltd.

MPCVD法金刚石同质外延生长及MOS器件技术Homogeneous epitaxial diamond growth by MPCVD and its MOS device technology张金风西安电子科技大学教授ZHANG JinfengProfessor of Xidian University

高性能GaN-on-GaN材料与器件的外延生长High output power and bandwidth of c-plane GaN-on-GaN micro-LED for high-speed visible light communication王国斌江苏第三代半导体研究院研发部负责人WANG GuobinSenior Project ManagerHead of RD Dept of Jiangsu Institute of Advanced Semiconductors

利用AlN传导层在GaN衬底上外延生长金刚石薄膜及其热传输特性Thermal dissipation from GaN to diamond with AlN conduction layer桑立雯日本国立物质材料研究所独立研究员SANG LiwenIndependent Scientist of National Institute for Materials Science (NIMS), Japan

平片蓝宝石衬底上高质量AlN材料MOCVD外延生长High quality AlN growth on flat sapphire at relative low temperature by MOCVD赵德刚中国科学院半导体所研究员ZHAO DegangProfesor of Institute of Semiconductors, CAS

郑州大学教授刘玉怀做了题为氮化铝/蓝宝石模板上六方氮化硼薄膜的有机金属气相外延研究的报告，介绍了多层h-BN膜的表面和结晶度、微观结构和键合结构。h-BN在AlN上的生长模型等研究内容。研究成功证明了通过脉冲模式MOVPE在AlN模板上直接生长单晶多层h-BN，在AlN表面上形成连续和聚结的多层h-BN，提出了初始帽形核的生长模型，然后在AlN上进行h-BN的二维横向生长。